发明名称 COOLING METHOD OF SEMICONDUCTOR WAFER AND COOLING APPARATUS OF SEMICONDUCTOR WAFER
摘要 PROBLEM TO BE SOLVED: To cool a semiconductor wafer covered with a resin or an adhesive tape with a simple configuration while suppressing generation of warpage.SOLUTION: A semiconductor wafer 1 in a heated state is placed on a heated holding table 5. The semiconductor wafer 1 is cooled by being separated and held above from the holding table 5. During the cooling process, the semiconductor wafer 1 is cooled while adjusting a temperature of the semiconductor wafer 1 that is cooled with radiation heat from the holding table 5, a rate at which the temperature of the semiconductor wafer 1 is reduced, and a cooling time.SELECTED DRAWING: Figure 5
申请公布号 JP2016039299(A) 申请公布日期 2016.03.22
申请号 JP20140162614 申请日期 2014.08.08
申请人 NITTO DENKO CORP;NITTO SEIKI CO LTD 发明人 HASE YUKITOSHI;MORI SHINICHIRO
分类号 H01L21/683;H01L21/304 主分类号 H01L21/683
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