System and method for modifying a data set of a photomask

摘要

The present invention provides a method for compensating infidelities of a process that transfers a pattern to a layer of an integrated circuit, by minimizing, with respect to a photomask pattern, a cost function that quantifies the deviation between designed and simulated values of circuit parameters of the pattern formed on a semiconductor wafer.

主权项

1. A method for modifying a data set used to produce a photomask comprising:
generating, with a computer system, a design intent of a circuit pattern to be created with the photomask based on the data set and at least one electrical parameter of the circuit pattern, wherein the at least one electrical parameter comprises at least one of saturation current, leakage current, threshold voltage and gain; simulating, with the computer system, the circuit pattern based on the data set and the at least one electrical parameter; comparing, with the computer system, the design intent to the simulated circuit pattern; calculating, with the computer system, a demerit function based on the comparison; and modifying, with the computer system, the data set based on the calculated demerit function in order to reduce the value of the demerit function.