发明名称 Silicon nitride substrate, circuit substrate and electronic device using the same
摘要 A silicon nitride substrate comprises a substrate comprising a silicon nitride sintered body, and a plurality of granular bodies containing silicon and integrated to a principal surface of the substrate, wherein a plurality of needle crystals or column crystals comprising mainly silicon nitride are extended from a portion of the granular bodies. A brazing material is applied to a principal surface of the substrate, and a circuit member and a heat radiation member are arranged on the applied brazing material, and bonded by heating. Because of a plurality of granular bodies integrated to the principal surface of the substrate, and a plurality of the needle crystals or the column crystals extended from a portion of the granular bodies, a high anchor effect is produced so that the circuit member and the heat radiation member are firmly bonded to the silicon nitride substrate.
申请公布号 US9293384(B2) 申请公布日期 2016.03.22
申请号 US201113522218 申请日期 2011.01.13
申请人 KYOCERA Corporation 发明人 Ishimine Yuusaku;Moriyama Masayuki;Komatsubara Kenji
分类号 H01L23/15;H05K7/20;H05K1/00;B32B33/00;H01L23/13;H01L35/32;C04B35/587;C04B37/02;H05K1/03;H05K3/38 主分类号 H01L23/15
代理机构 Procopio, Cory, Hargreaves & Savitch LLP 代理人 Procopio, Cory, Hargreaves & Savitch LLP
主权项 1. A silicon nitride substrate comprising a substrate comprising a silicon nitride sintered body, and a plurality of granular bodies containing silicon and integrated to a principal surface of the substrate, wherein a plurality of needle crystals or column crystals comprising mainly silicon nitride are extended from a surface of the granular bodies at an extended length of 2 μm or more and 10 μm or less, and wherein a diameter of the needle crystals or the column crystals at the middle of the extended length is 0.2 μm or more and 5 μm or less.
地址 Kyoto JP
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