| 主权项 |
1. An exposure apparatus that exposes a substrate with illumination light via a projection optical system, the apparatus comprising:
a body having a metrology frame, the metrology frame supporting the projection optical system in an exposure station where an exposure of the substrate is performed; a first detection system that is supported by the metrology frame in a measurement station different from the exposure station and that detects a mark of the substrate; a base member placed below the projection optical system and the first detection system; a stage that has a holder to hold the substrate and is placed on the base member; a drive system that has a planar motor to drive the stage supported by levitation on the base member, and that moves the stage from one of the exposure station and the measurement station to the other by the planar motor, and also drives the stage so that the substrate is moved in directions of six degrees of freedom including a first direction and a second direction orthogonal to each other within a predetermined plane perpendicular to an optical axis of the projection optical system and a third direction orthogonal to the predetermined plane; a measurement system that has four heads provided at the stage and each irradiating a measurement beam to a scale member from below, and that measures positional information of the stage in the directions of six degrees of freedom, the scale member having four sections and an opening, and the four sections each having a reflection-type grating formed; and a controller coupled to the drive system, that controls a drive of the stage by the drive system based on the positional information measured by the measurement system, wherein the scale member is supported by the metrology frame so that the projection optical system is positioned in the opening, the four heads are provided at the stage so that a distance between two heads of the four heads is larger than a width of the opening, a movement area of the stage within the exposure station, in an exposure operation of the substrate, includes a first area, a second area, a third area, a fourth area and a fifth area,
in the first area three heads of the four heads except for a first head respectively facing three sections of the four sections except for a first section,in the second area three heads of the four heads except for a second head different from the first head respectively facing three sections of the four sections except for a second section different from the first section,in the third area three heads of the four heads except for a third head different from the first and the second heads respectively facing three sections of the four sections except for a third section different from the first and the second sections,in the fourth area three heads of the four heads except for a fourth head different from the first, the second and the third heads respectively facing three sections of the four sections except for a fourth section different from the first, the second and the third sections, andin the fifth area the four heads respectively facing the four sections, and the controller controls the drive system so that the stage is moved from one area of the first, the second, the third and the fourth areas to another area of the first, the second, the third and the fourth areas, via the fifth area, the another area being different from the one area and also performs drive control of the stage by three heads used in the another area, using correction information to compensate for a measurement error of the measurement system that occurs due to performing drive control of the stage by three heads used in the another area instead of drive control of the stage by three heads used in the one area, and the correction information is acquired from the positional information obtained from the four heads during a time at which the stage is in the fifth area. |
