Faraday shield having plasma density decoupling structure between TCP coil zones

摘要

A Faraday shield and a plasma processing chamber incorporating the Faraday shield is are provided. The plasma chamber includes an electrostatic chuck for receiving a substrate, a dielectric window connected to a top portion of the chamber, the dielectric window disposed over the electrostatic chuck, and a Faraday shield. The Faraday shield is disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window. The Faraday shield includes an inner zone having an inner radius range that includes a first and second plurality of slots and an outer zone having an outer radius range that includes a third plurality of slots. The inner zone is adjacent to the outer zone. The Faraday shield also includes a band ring separating the inner zone and the outer zone, such that the first and second plurality of slots do not connect with the third plurality of slots.

主权项

1. A plasma processing chamber, comprising:
an electrostatic chuck for receiving a substrate; a dielectric window connected to a top portion of the chamber, the dielectric window disposed over the electrostatic chuck; a transformer coupled plasma (TCP) coil having a substantially flat coil distribution that is disposed over the dielectric window; a Faraday shield disposed inside of the chamber and defined between the electrostatic chuck and the dielectric window, the Faraday shield having a flat circular plate structure that is disposed under the dielectric window and inside the chamber; the Faraday shield includes,
(a) an inner zone having an inner radius range that includes a first and second plurality of slots;(b) an outer zone having an outer radius range that includes a third plurality of slots, the inner zone being adjacent to the outer zone; and(c) a band ring separating the inner zone and the outer zone, such that the first and second plurality of slots do not connect with the third plurality of slots,wherein the inner zone and the outer zone are coupled together by way of the band ring,wherein the band ring is part of the flat circular plate structure and the band ring has a width that is less than about 15 mm, the band ring is configured to decouple magnetic flux generation and having the width of the band ring less than 15 mm acts to prevent plasma blockage under the band ring that would cause power non-uniformities to transfer to a substrate when processed in the plasma processing chamber; wherein the first, second and third plurality of slots are arranged and extend out radially from a center of the Faraday shield, and the Faraday shield is electrically grounded.