发明名称 |
Forming method and substrate |
摘要 |
The present invention provides a method of forming a detection mark from line patterns formed on a substrate, including a first step of deciding a first region for forming the detection mark on the substrate, and a second region which surrounds the first region and in which formation of the detection mark is forbidden, and a second step of projecting, onto the substrate by a projection optical system, patterns including a first cut pattern for partially cutting the line pattern in the first region to form a plurality of mark elements, and a removal pattern for removing the line pattern in the second region, and forming the detection mark including the plurality of mark elements. |
申请公布号 |
US9291903(B2) |
申请公布日期 |
2016.03.22 |
申请号 |
US201414322117 |
申请日期 |
2014.07.02 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Tsujita Koichiro |
分类号 |
H01L21/76;H01L23/544;G01B11/00;G03F7/20 |
主分类号 |
H01L21/76 |
代理机构 |
Rossi, Kimms & McDowell LLP |
代理人 |
Rossi, Kimms & McDowell LLP |
主权项 |
1. A method of forming a detection mark from a line pattern formed on a substrate, comprising:
a first step of deciding a first region for forming the detection mark on the substrate, and a second region which surrounds the first region and in which formation of the detection mark is forbidden; and a second step of projecting, onto the substrate by a projection optical system, patterns including a first cut pattern for partially cutting the line pattern in the first region to form a plurality of mark elements, and a removal pattern for removing the line pattern in the second region, and forming the detection mark including the plurality of mark elements. |
地址 |
Tokyo JP |