发明名称 |
Method for setting shot-peening process condition |
摘要 |
A method for setting a shot-peening process condition includes a step of obtaining, for each of a plurality of peening conditions for a first combination as a combination of a shot peening processing apparatus and media, a saturation time based on a saturation curve indicating a change in an arc height value of an Almen strip against a projection time. The method includes a step of determining a first optimum peening condition corresponding to the first combination based on the saturation time. |
申请公布号 |
US9289880(B2) |
申请公布日期 |
2016.03.22 |
申请号 |
US201013254760 |
申请日期 |
2010.01.29 |
申请人 |
MITSUBISHI HEAVY INDUSTRIES, LTD. |
发明人 |
Yamada Takeshi;Inoue Akiko |
分类号 |
B24C1/10;B24C7/00;C21D7/06 |
主分类号 |
B24C1/10 |
代理机构 |
Wenderoth, Lind & Ponack, L.L.P. |
代理人 |
Wenderoth, Lind & Ponack, L.L.P. |
主权项 |
1. A method for setting a shot peening process condition comprising:
obtaining, for each of a plurality of peening conditions for a first combination as a combination of a shot peening processing apparatus and media, a saturation time based on a saturation curve indicating a change in an arc height value of an Almen strip with respect to a projection time, each of said plurality of peening conditions specifying values of condition factors; determining optimum values of said condition factors of a first optimum peening condition corresponding to said first combination from said plurality of peening conditions based on said saturation time; and determining a spot movement condition based on a relation between a projection time of said media and an area or a width of a region of a test piece, where a dimpled area rate is saturated, wherein said condition factors of said plurality of peening conditions include: a first condition factor; and a second condition factor; wherein said plurality of peening conditions includes: a first peening condition; a second peening condition different from said first peening condition in only said value of said first condition factor; a third peening condition; and a fourth peening condition different from said third peening condition in only said value of said second condition factor; wherein said determining said optimum values of said condition factors of said first optimum peening condition based on said saturation time includes: determining said optimum value of said first condition factor in said first optimum peening condition based on a first saturation time under said first peening condition and a second saturation time under said second peening condition; and determining said optimum value of said second condition factor in said first optimum peening condition based on a third saturation time under said third peening condition and a fourth saturation time under said fourth peening condition; wherein said shot peening processing apparatus projects said media from a nozzle by using air; and wherein said first condition factor and said second condition factor are two of a flow rate of said media, a pressure of said air, an inner diameter of said nozzle, and a movement speed of said nozzle. |
地址 |
Tokyo JP |