| 发明名称 | Liquid treatment apparatus and method and non-transitory storage medium | ||
| 摘要 | A liquid treatment method includes: supplying a first organic solvent to a substrate with the substrate being held horizontally by a substrate holder; and thereafter supplying a second organic solvent to a substrate held by the substrate holder, the second solvent having a higher cleanliness than the first solvent. | ||
| 申请公布号 | US9293320(B2) | 申请公布日期 | 2016.03.22 |
| 申请号 | US201313865311 | 申请日期 | 2013.04.18 |
| 申请人 | Tokyo Electron Limited | 发明人 | Yoshida Yuichi;Yoshihara Kousuke |
| 分类号 | H01L21/02;H01L21/67;G03F7/16;G03F7/30;G03F7/32 | 主分类号 | H01L21/02 |
| 代理机构 | Burr & Brown, PLLC | 代理人 | Burr & Brown, PLLC |
| 主权项 | 1. A liquid treatment method comprising: supplying a first organic solvent to a substrate with the substrate being held horizontally by a substrate holder; thereafter supplying a second organic solvent to the substrate held by the substrate holder, the second solvent passed through a filter at least one more time than the first solvent, wherein the first organic solvent and the second organic solvent have the same composition and are different from one another only in a number of times filtered. | ||
| 地址 | Minato-Ku JP | ||