发明名称 Drawing apparatus, and method of manufacturing article
摘要 The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus including a controller configured to perform control of the drawing performed by movement of a stage and a blanking function of each of a plurality of charged particle optical systems, wherein the controller is configured to perform, with respect to a first charged particle optical system, of the plurality of charged particle optical systems, from a plurality of charged particle beams reach a first region and a second region, formed on the substrate and adjacent to each other, the control such that the drawing is performed only in one of the first and second regions with a first portion of charged particle beams of the plurality of charged particle beams with the stage moved in a second direction.
申请公布号 US9293292(B2) 申请公布日期 2016.03.22
申请号 US201414228415 申请日期 2014.03.28
申请人 CANON KABUSHIKI KAISHA 发明人 Muraki Masato;Hirata Yoshihiro
分类号 H01J37/04;H01J37/317;H01J37/20 主分类号 H01J37/04
代理机构 Rossi, Kimms & McDowell LLP 代理人 Rossi, Kimms & McDowell LLP
主权项 1. A drawing apparatus for performing drawing on a substrate, on which a plurality of shot regions have been formed, with a charged particle beam, the drawing apparatus comprising: a plurality of charged particle optical systems each having a blanking function of individually blanking a plurality of charged particle beams arrayed in a first direction, the plurality of charged particle optical systems being arranged at an interval in the first direction; a stage configured to hold the substrate and be movable; and a controller configured to perform: control of the drawing performed by movement of the stage and the blanking function of each of the plurality of charged particle optical systems so that each of the plurality of charged particle optical systems performs the drawing in stripe regions corresponding thereto stripe by stripe, each of the stripe regions being disposed along a second direction that is different from the first direction;with respect to a first charged particle optical system, among the plurality of charged particle optical systems, of which one of the stripe regions is on a first shot region and a second shot region, among the plurality of the shot regions, adjacent to each other in the first direction, the control so that the drawing is performed by the first charged particle optical system in either the first or second shot region in the one of the stripe regions with a first portion of the plurality of charged particle beams while the stage is being moved in the second direction; andwith respect to the first charged particle optical system, after the drawing in either the first or second shot region in the one of the stripe regions, without changing the one of the stripe regions to another of the stripe regions, the control so that the drawing is performed by the first charged particle optical system in the other of the first or second shot region in the one of the stripe regions with a second portion of the plurality of charged particle beams different from the first portion while the stage is being moved in a direction opposite to the second direction.
地址 Tokyo JP