发明名称 アクティブマトリクス基板、液晶表示装置およびアクティブマトリクス基板の製造方法
摘要 An active matrix substrate (100A) includes a TFT (20), a scanning line (11) substantially parallel to a first direction, a signal line (12) substantially parallel to a second direction which is orthogonal to the first direction, a first interlayer insulating layer (16) covering the TFT, a lower layer electrode (17) provided on the first interlayer insulating layer, a dielectric layer (18) provided on the lower layer electrode, and an upper layer electrode (19) overlapping at least a portion of the lower layer electrode via the dielectric layer. A first contact hole (31) includes a first aperture ( 16a ) formed in the first interlayer insulating layer and a second aperture ( 18a ) formed in the dielectric layer. A width of the first aperture along one of the first direction and the second direction is smaller than a width of the second aperture along the one direction. A portion of the contour of the second aperture is located inside the contour of the first aperture, and the contour of the second aperture is not rectangular. The area of the portion of the second aperture not overlapping the first aperture is smaller than that in an imaginary case where the contour of the second aperture is rectangular.
申请公布号 JP5890901(B2) 申请公布日期 2016.03.22
申请号 JP20140522560 申请日期 2013.06.18
申请人 シャープ株式会社 发明人 天野 徹
分类号 G02F1/1368;G02F1/1343 主分类号 G02F1/1368
代理机构 代理人
主权项
地址