| 摘要 |
PROBLEM TO BE SOLVED: To suppress the degradation of a heat transfer sheet.SOLUTION: Provided is a plasma processing device comprising a focus ring provided outside a substrate put on a work-holder table with a temperature-control mechanism, which is brought into contact with the work-holder table through a heat transfer sheet. The focus ring has a heat insulation layer with a thermal conductivity lower than that of the focus ring; the heat insulation layer is provided on, of faces of the focus ring, a face on the side of the heat transfer sheet.SELECTED DRAWING: Figure 3 |
