| 摘要 |
PROBLEM TO BE SOLVED: To provide a focus correction device, a focus correction method and a program capable of reducing focus variation.SOLUTION: The focus correction device has input means and correction data generation means. The input means inputs a data of a first defocus amount which is obtained, by using an external measuring device, by measuring a QC wafer formed by an external exposure device and a data of a second defocus amount which is obtained by measuring, by using an external measuring device, a product wafer which is formed by the external exposure device. The correction data generation means interpolates the second defocus amount on the basis of the first defocus amount to generate a higher level focus correction data of entire of the wafer.SELECTED DRAWING: Figure 1 |
