| 发明名称 | Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus | ||
| 摘要 | A method of cleaning a lithography apparatus using an aerosol spray is described. The spray from the aerosol is contained in a space. | ||
| 申请公布号 | US9289802(B2) | 申请公布日期 | 2016.03.22 |
| 申请号 | US200812314611 | 申请日期 | 2008.12.12 |
| 申请人 | ASML NETHERLANDS B.V. | 发明人 | De Jong Anthonius Martinus Cornelis Petrus;Jansen Hans;Vugts Josephus Cornelius Johannes Antonius;Van Der Donck Jacques Cor Johan;Van Den Dool Teunis Cornelis;Oosterhuis Gerrit |
| 分类号 | G03B27/52;B08B3/02;B08B5/02;G03F7/20 | 主分类号 | G03B27/52 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A lithography apparatus, comprising: an aerosol spray orifice configured to direct an aerosol spray of solid or liquid particles suspended in gas at a surface to be cleaned; and an outlet configured to face the surface and exhaust at least part of the aerosol spray, a first portion of the aerosol spray orifice located at a first side of the outlet and a second portion of the aerosol spray orifice located at a second side, opposite the first side, of the outlet such that the outlet exhausts the at least part of the aerosol spray from the first and second portions. | ||
| 地址 | Veldhoven NL | ||