APPARATUS FOR INSPECTING THE RETICLE AND METHOD THEREOF

摘要

Provided is a method and an apparatus for inspecting reticles. More specifically, the purpose of the present invention is to provide an apparatus for inspecting reticles, which inspects particle formation by comparing a scanned image before and after the fixation of a pellicle on the reticle, thereby enabling reticle inspection even in a photolithography system which uses extreme ultraviolet light. The apparatus of the present invention comprises: the reticle; a scan image generation part generating a scan image of a surface of the reticle; and an image processing part receiving a first image and a second image from the scan image generation part so as to compare the both. The first image is scanned while a pellicle is not fixed on the reticle, whereas the second image is scanned while the pellicle is fixed on the reticle.