| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition excellent in heat resistance.SOLUTION: As the essential components of a photosensitive component, a potential oxide preventive (A), an oxidation preventive (B) (except for the potential oxide preventive (A)) of at least one kind selected from a light stabilizer and an ultraviolet absorber and a light acid generator or a light polymerization initiator (C) are incorporated. Preferably, as the potential oxide preventive (A), a compound with a skeleton represented by general formula (I), particularly a compound represented by general formula (I-A) is used, and, as the light acid generator or the light polymerization initiator (C), an aromatic sulfonium salt or an aromatic iodonium salt is used, or a radical polymerization initiator is used.SELECTED DRAWING: None |
