| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an abrasive composition which can reduce residue of the abrasive on the surface of an object. <P>SOLUTION: In a grinding method where a plurality of abrasive compositions are fed in order to an object the surface of which is rubbed with an identical polishing pad, this abrasive composition is used as one among the plurality of abrasive compositions, and fed to the surface of the object after an abrasive composition including an abrasive among the plurality of abrasive compositions. The abrasive composition contains colloidal silica, an acid and water, wherein the colloidal silica has 35% or more accumulated volume frequency of 50 nm particle diameter in the volume-based particle size distribution, and 90% or less accumulated volume frequency of 15 nm particle diameter in the particle size distribution, measured as a Heywood diameter. <P>COPYRIGHT: (C)2012,JPO&INPIT |
