发明名称 |
Trench-based power semiconductor devices with increased breakdown voltage characteristics |
摘要 |
Exemplary power semiconductor devices with features providing increased breakdown voltage and other benefits are disclosed. |
申请公布号 |
US9293526(B2) |
申请公布日期 |
2016.03.22 |
申请号 |
US201213667319 |
申请日期 |
2012.11.02 |
申请人 |
Fairchild Semiconductor Corporation |
发明人 |
Yedinak Joseph A.;Challa Ashok;Probst Dean |
分类号 |
H01L29/66;H01L29/06;H01L29/78;H01L29/872;H01L29/739;H01L29/10;H01L29/40;H01L29/417;H01L29/423 |
主分类号 |
H01L29/66 |
代理机构 |
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代理人 |
|
主权项 |
1. A semiconductor device comprising:
a gate runner disposed above a semiconductor region; a trench disposed in the semiconductor region and having a first portion disposed on a first side of the gate runner and a second portion disposed on a second side of the gate runner; a shield dielectric disposed in the semiconductor region and lining a sidewall of the trench; a shield electrode disposed in the semiconductor region and having a first portion disposed in the first portion of the trench, the shield electrode having a second portion disposed in the second portion of the trench; a gate dielectric disposed in the semiconductor region and lining an upper sidewall of the second portion of the trench; a gate electrode disposed in the semiconductor region and disposed in the second portion of the trench and insulated from the second portion of the shield electrode; and a shield runner made of a metal and disposed above the semiconductor region and having a portion contacting a top surface of the first portion of the shield electrode, the top surface of the first portion of the shield electrode being at or below a top surface of the semiconductor region. |
地址 |
San Jose CA US |