发明名称 Spatial light modulator, exposure apparatus, and method for manufacturing device
摘要 A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.
申请公布号 US9291814(B2) 申请公布日期 2016.03.22
申请号 US201113825634 申请日期 2011.09.16
申请人 Nikon Corporation 发明人 Owa Soichi;Watanabe Yoji;Fujiwara Tomoharu
分类号 G03B27/72;G03B27/54;G02B26/00;G02B26/06;G02B5/09;G02B27/42;G03F7/20 主分类号 G03B27/72
代理机构 Klarquist Sparkman, LLP 代理人 Klarquist Sparkman, LLP
主权项 1. A spatial light modulator that modulates incident light and emits the modulated light, the spatial light modulator comprising: a plurality of reflective elements that have reflective surfaces situated to reflect the incident light, each reflective surface being able to change at least one of position and inclination; a first portion situated to reflect light incident to a gap between the reflective surfaces of adjacent reflective elements, and a second portion that reflects light incident to the gap, wherein the first portion and the second portion are situated at the gap between the adjacent reflective elements so that a predetermined phase difference is set between light reflected by the first portion and the second portion.
地址 Tokyo JP