| 发明名称 | Exposure apparatus and method of manufacturing article | ||
| 摘要 | An exposure apparatus includes an optical system configured to expose a substrate. The optical system includes an optical member, a holding portion which holds the optical member, a pressing portion which presses the holding portion and the optical member against each other, and a sealed adhesive material which is filled in a space formed by the optical member and the holding portion pressed against each other, and adheres the optical member and the holding portion to each other. | ||
| 申请公布号 | US9291912(B2) | 申请公布日期 | 2016.03.22 |
| 申请号 | US201313966512 | 申请日期 | 2013.08.14 |
| 申请人 | CANON KABUSHIKI KAISHA | 发明人 | Mochizuki Shinya;Maehara Yuji |
| 分类号 | G02B7/02;G02B7/182;G03B27/32;G03B27/52;G03B27/54;G03F7/20 | 主分类号 | G02B7/02 |
| 代理机构 | Rossi, Kimms & McDowell LLP | 代理人 | Rossi, Kimms & McDowell LLP |
| 主权项 | 1. An exposure apparatus including an optical system configured to expose a substrate, the optical system comprising: an optical member which includes a held portion; a holding portion which includes a holding surface in contact with a held surface of the held portion, and holds the optical member; a pressing portion which presses the holding surface of the holding portion and the held surface of the held portion against each other; and an adhesive material which is filled in a groove formed in the holding surface, the held surface, or the holding surface and the held surface, and adheres the optical member and the holding portion to each other, wherein the holding surface and the held surface contact each other in a region surrounding the groove such that the adhesive material is sealed within the groove by the region surrounding the groove. | ||
| 地址 | Tokyo JP | ||