发明名称 METHOD FOR FABRICATING WAFER STRUCTURE HAVING LATERAL JUNCTION
摘要 The present invention relates to a method for fabricating a wafer structure having a lateral junction to improve process reproducibility. The method includes a step of forming the wafer structure on a first substrate; a step of cutting the wafer structure and forming a plate-shaped vertical wafer structure; and a step of transferring the vertical wafer structure to the plane of a second substrate. In the transfer step, the vertical wafer structure is transferred to a lateral wafer structure on the plane of the second substrate. The method can improve mechanical stability and reduce the generation of errors in processes.
申请公布号 KR101605655(B1) 申请公布日期 2016.03.22
申请号 KR20150052990 申请日期 2015.04.15
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 CHO, YONG HOON;KIM, SE JEONG
分类号 H01L33/00;H01L33/04 主分类号 H01L33/00
代理机构 代理人
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