Mechanisms for monitoring ion beam in ion implanter system

摘要

In accordance with some embodiments, an assembly of an ion implanter system is provided. The assembly includes a control unit, a wafer holder and a detecting device. The wafer holder and the detecting device are respectively positioned at two sides of the control unit. The control unit is configured to drive the wafer holder and the detecting device to rotate about at least one rotation axis.

主权项

1. An assembly of an ion implanter system, comprising:
a control unit; a wafer holder having a supporting surface and a back surface, wherein the supporting surface is configured for holding a wafer, and the back surface is opposite to the supporting surface; and a detecting device, wherein the wafer holder and the detecting device are respectively positioned at two sides of the control unit, and the control unit is configured to simultaneously drive the wafer holder and the detecting device to rotate about at least one rotation axis, wherein an orthogonal projection of the entire detecting device formed on the back surface of the wafer holder is within an edge of the wafer holder.