发明名称 COMPOSITION FOR FORMING CONDUCTIVE FILM, CONDUCTIVE FILM, METHOD OF MANUFACTURING PLATING FILM, PLATING FILM AND ELECTRONIC DEVICE
摘要 The present invention relates to a conductive film forming composition for forming a conductive film showing excellent adhesion with a substrate and low resistance. The present invention also relates to a conductive film, a preparing method for the same, a plating film, and an electronic device. The conductive film forming composition includes: (A) at least one of the metal salt and metal particles including at least one type of metal selected from a group including Ni, Pd, Pt, Cu, Ag, and Au; and (B) a metaloxane compound. The composition is used to form the conductive film on the substrate, execute a heating operation in an atmosphere or non-oxidizing atmosphere under the temperature of 250°C, form a conductive film on the substrate, and prepare a wiring board. The composition can also be used to form the conductive film on a transparent substrate (22) with first and second sensing electrodes (23, 24) and form an outgoing wire (31) by heating the conductive film in order to prepare the touch panel (21).
申请公布号 KR20160031402(A) 申请公布日期 2016.03.22
申请号 KR20150098199 申请日期 2015.07.10
申请人 JSR CORPORATION 发明人 SHIMODA SUGIROU;OOKITA KENZOU;SATOU KEISUKE;WATANABE KAZUTO
分类号 H01B1/22;H01B1/02;H01B13/00;H05K3/12 主分类号 H01B1/22
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