A gas mixture apparatus includes a measurement control system, an activation system, a pressurized chamber with one or more gases, and a mixing chamber. The apparatus can also include additional pressure regulation control systems. The gas mixture apparatus can be used to introduce and automatically perform the steps to achieve a desired concentration of the one or more gases contained in the pressurized chamber. The gas mixture apparatus can include the pressurized chamber within the apparatus itself such that no external devices are necessary for introducing the one or more gases into the mixing chamber.
申请公布号
HK1208794(A1)
申请公布日期
2016.03.18
申请号
HK20150109514
申请日期
2015.09.28
申请人
ALTAVIZ LLC
发明人
AULD, JACK, R.;HUCULAK, JOHN, C.;MCCOLLAM, CHRISTOPHER, L.