LIQUID CRYSTAL DISPLAY AND ELEMENT SUBSTRATE THEREOF

摘要

An element substrate is provided, including a substrate, a metal layer, a planarization layer and a first conductive layer. The metal layer is disposed on the substrate. The planarization layer is located on the metal layer, wherein the planarization layer includes a contact hole, the contact hole has a continuous wall and a bottom, the bottom exposes the metal layer, and the bottom of the contact hole has a first width. The first conductive layer is located on the planarization layer, wherein the first conductive layer includes an opening, the opening exposes the contact hole, and the opening has a second width above the contact hole, wherein the relationship of the first width and the second width is modified to decrease illumination loss and to prevent problems of shot-circuiting and insufficient capacitance.

主权项

1. An element substrate, comprising:
a substrate; a metal layer, disposed on the substrate; a planarization layer, located on the metal layer, wherein the planarization layer comprises a contact hole, the contact hole has a continuous wall and a bottom, the bottom exposes the metal layer, and the bottom of the contact hole has a first width; a first conductive layer, located on the planarization layer, wherein the first conductive layer comprises an opening, the opening exposes the contact hole, the opening has a second width above the contact hole; wherein the first width and the second width satisfy the following equation:2*{L12+0.95hln(0.05)·tan(1.5θ)·ln[-0.134ln(0.05)·tan(1.5θ)]}≤L2≤2*{L12+0.95hln(0.05)·tan(1.5θ)·ln[-0.00166ln(0.05)·tan(1.5θ)]} wherein L1 is the first width, L2 is the second width, h is a thickness of the planarization layer, θ is an included angle between a straight line and an extension surface of the bottom, the straight line connects a reference point and a base point, and the reference point is located on the continuous wall, wherein a vertical distance from the reference point to the bottom is 0.95 h, and the base point is located at the point where the continuous wall is connected to the bottom.