VAPOR DEPOSITION APPARATUS, VAPOR DEPOSITION METHOD AND ORGANIC EL ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus and a vapor deposition method, capable of forming accurately a co-vapor-deposited film, even when co-depositing two or more kinds of materials; and to provide an organic EL element using the same.SOLUTION: A vapor deposition apparatus 11 is provided with: first and second vapor deposition sources 12 and 13; common piping 27 connected to the first and second vapor deposition sources 12 and 13; a vapor deposition particle emission source 29 connected to the common piping 27, for emitting vapor deposition particles from each of the first and second vapor deposition sources 12 and 13; an exhaust valve 32 connected to the vapor deposition particle emission source 29; and an air displacement pump 34 connected to the exhaust valve 32.SELECTED DRAWING: Figure 2