THE APPARATUS OF CLEANING BY DI WATER A HIGH TEMPERATURE AND MIST FORMATION

摘要

The present invention relates to a smart NR type cleaning apparatus through a high temperature mist type DI for cleaning a semiconductor wafer. The smart NR type cleaning apparatus includes: an N2 gas supply unit (10) storing an N2 gas and introducing the N2 gas into an inner space of an electricity heat generation unit; a first pressure adjustment valve (20) controlling an N2 gas amount and a velocity; an electricity heat generation unit (30) supplying a high temperature N2 gas after generating the high temperature N2 gas; a second pressure adjustment valve (40) controlling a high temperature N2 gas amount and a velocity; a bubble type DI water supply unit (50) supplying bubble type DI Water; a third pressure adjustment valve (60) controlling the bubble type DI Water and a velocity; a fluid convection current type high temperature DI formation unit (70); a fourth pressure adjustment valve (80) controlling a high temperature DI amount and a velocity; a binary nozzle unit (90) spraying a high temperature DI liquid in the form of mist; and a PLC control module (100) controlling for forced convection to be formed.