发明名称 POSITION MEASUREMENT METHOD, METHOD FOR CREATING MAP OF POSITIONAL DEVIATION, AND INSPECTION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a position measurement method by which a pattern position can be accurately perceived, a creation method of a positional deviation map, and an inspection system.SOLUTION: A mask includes a plurality of inspection target patterns and a plurality of position measurement patterns disposed in a region where the inspection target patterns are disposed and in a periphery of the region. Position coordinates of the position measurement pattern are measured with a position measurement device. An optical image of the position measurement pattern is obtained while measuring position coordinates of a table that mounts the mask so as to create first position correction data. The first position correction data is corrected by using position coordinates of a second pattern by the position measurement device so as to create a second position correction data. Each optical image of the inspection target pattern and the position measurement pattern is obtained while measuring the position coordinates of the table so as to obtain position coordinates of each pattern. The position coordinates of the inspection target pattern are corrected by using the second position correction data.SELECTED DRAWING: Figure 1
申请公布号 JP2016035542(A) 申请公布日期 2016.03.17
申请号 JP20140159062 申请日期 2014.08.04
申请人 NUFLARE TECHNOLOGY INC 发明人 INOUE HIROSHI
分类号 G03F1/84;G01B11/00;G01B11/30;G01N21/956 主分类号 G03F1/84
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