| 摘要 |
PROBLEM TO BE SOLVED: To provide an illumination system for illuminating a mask in a microlithography projection exposure apparatus, in particular, a system including an array of reflection elements that can be achieved as a micro-electromechanical system (MEMS).SOLUTION: The illumination system for illuminating a mask in a microlithography projection exposure apparatus has an objective system including an objective plane, at least one pupil plane, and an image plane where a mask can be disposed. A beam deflection array comprising reflective or transmissive beam deflecting elements (M;T) is disposed, in which each beam deflecting element (M;T) is configured to respond to a control signal to deflect an incident beam at a variable deflection angle. The beam deflecting element (M;T) is disposed on the objective plane or closest to the objective plane of the objective system.SELECTED DRAWING: Figure 2 |
