发明名称 |
METHOD FOR MANUFACTURING STRUCTURE HAVING RECESSED PATTERN, RESIN COMPOSITION, METHOD FOR FORMING ELECTROCONDUCTIVE FILM, ELECTRONIC CIRCUIT, AND ELECTRONIC DEVICE |
摘要 |
The present invention relates to a method for manufacturing a structure having a recessed pattern, to a resin composition, to a method for forming an electroconductive film, to an electronic circuit, and to an electronic device, the method for manufacturing a structure having a recessed pattern including steps (i) and (ii), and the recessed pattern having a film thickness 5% to less than 90% of the film thickness of a coating film obtained in step (i). (i): A step for forming a coating film on a non-flat surface of a structure using a resin composition including an acid-generating agent and a polymer having an acid-dissociable group. (ii): A step for forming a recess by irradiation of a predetermined portion of a section of the coating film. |
申请公布号 |
WO2016039327(A1) |
申请公布日期 |
2016.03.17 |
申请号 |
WO2015JP75441 |
申请日期 |
2015.09.08 |
申请人 |
JSR CORPORATION |
发明人 |
HAMAGUCHI, HITOSHI;TANAKA, KENROU;OOKITA, KENZOU;KURIYAMA, KEISUKE |
分类号 |
B05D3/06;B29C59/16;C08J7/00;G03F7/004;G03F7/039;G03F7/26 |
主分类号 |
B05D3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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