发明名称 METHOD FOR MANUFACTURING STRUCTURE HAVING RECESSED PATTERN, RESIN COMPOSITION, METHOD FOR FORMING ELECTROCONDUCTIVE FILM, ELECTRONIC CIRCUIT, AND ELECTRONIC DEVICE
摘要 The present invention relates to a method for manufacturing a structure having a recessed pattern, to a resin composition, to a method for forming an electroconductive film, to an electronic circuit, and to an electronic device, the method for manufacturing a structure having a recessed pattern including steps (i) and (ii), and the recessed pattern having a film thickness 5% to less than 90% of the film thickness of a coating film obtained in step (i). (i): A step for forming a coating film on a non-flat surface of a structure using a resin composition including an acid-generating agent and a polymer having an acid-dissociable group. (ii): A step for forming a recess by irradiation of a predetermined portion of a section of the coating film.
申请公布号 WO2016039327(A1) 申请公布日期 2016.03.17
申请号 WO2015JP75441 申请日期 2015.09.08
申请人 JSR CORPORATION 发明人 HAMAGUCHI, HITOSHI;TANAKA, KENROU;OOKITA, KENZOU;KURIYAMA, KEISUKE
分类号 B05D3/06;B29C59/16;C08J7/00;G03F7/004;G03F7/039;G03F7/26 主分类号 B05D3/06
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