发明名称 METHOD FOR MEASURING FLOW RATE OF GAS USING CHEMICAL REACTION
摘要 PROBLEM TO BE SOLVED: To provide a flow rate measuring method which allows measurement of a flow rate in each air hole in a narrow part where a space enough for disposing a normal sensor or flow rate measurement device cannot be secured, and is suitable for analyzing the drift of a gas flowing through a gas processor, and also to link the analysis of the drift of a gas flowing through the gas processor to designing of an optimal adsorption tower.SOLUTION: In a method for measuring, in a gas processor having many air holes, the flow rate of a gas passing each of the air holes, a test gas having reactivity is continuously flowed in the gas processor to allow the test gas passing each air hole to react with a detection agent closely provided in each air hole or with a detection adsorption material charged into the gas processor, and by measuring the amount of a reaction product produced between the detection agent and the test gas, the amount of change in weight of the detection agent or the amount of change in color, the flow rate of the gas passing each air hole is measured. In addition, the drift is analyzed from the flow rate of the gas passing each air hole.SELECTED DRAWING: Figure 1
申请公布号 JP2016035445(A) 申请公布日期 2016.03.17
申请号 JP20150032658 申请日期 2015.02.23
申请人 TOKYO ELECTRIC POWER CO INC:THE 发明人 UMEDA YOKO
分类号 G01F1/00 主分类号 G01F1/00
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