IMPRINT APPARATUS, IMPRINT SYSTEM, AND METHOD OF MANUFACTURING ARTICLE

摘要

The present invention provides an imprint apparatus which performs an imprint process for forming a pattern on an imprint material on a substrate using a mold, the apparatus including an obtaining unit configured to obtain each shape of a plurality of shot regions on the substrate before the mold and the shot region as an imprint target on the substrate face each other, a first correction unit configured to correct, for each shot region on the substrate, a shape difference between a pattern of the mold and the shot region, a measurement unit configured to measure a displacement between the pattern of the mold and the shot region on the substrate, a second correction unit configured to correct the displacement, and a control unit configured to control the imprint process.

主权项

1. An imprint apparatus which performs an imprint process for forming a pattern on an imprint material on a substrate using a mold, the apparatus comprising:
an obtaining unit configured to obtain each shape of a plurality of shot regions on the substrate before the mold and the shot region as an imprint target on the substrate face each other; a first correction unit configured to correct, for each shot region on the substrate, a shape difference between a pattern of the mold and the shot region; a measurement unit configured to measure a displacement between the pattern of the mold and the shot region on the substrate; a second correction unit configured to correct the displacement; and a control unit configured to control the imprint process; wherein the imprint process includes a first process of causing the first correction unit to correct the shape difference based on the shape obtained in advance by the obtaining unit, and a second process of causing the second correction unit to correct the displacement while the displacement is measured by the measurement unit.