MANUFACTURING METHOD OF N-TYPE DIFFUSION LAYER AND MANUFACTURING METHOD OF SOLAR CELL ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method for forming an n-type diffusion layer with less residue derived from a dispersion medium in a specific part of a silicon substrate without forming an unnecessary n-type diffusion layer in a manufacturing process of a solar cell element using the silicon substrate, and to provide a manufacturing method of the solar cell element.SOLUTION: An n-type diffusion layer 12 is formed on a silicon substrate using an n-type diffusion layer formation composition containing glass powder including a donor element and a dispersion medium. Then, ultrasonic cleaning is performed.SELECTED DRAWING: Figure 1