发明名称 NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN
摘要 A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
申请公布号 WO2016038476(A1) 申请公布日期 2016.03.17
申请号 WO2015IB55621 申请日期 2015.07.24
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;SHIN-ETSU CHEMICAL CO., LTD;IBM UNITED KINGDOM LIMITED;IBM JAPAN LIMITED 发明人 SOORIYAKUMARAN, RATNAM;SUNDBERG, LINDA, KARIN;SANCHEZ, MARTHA, INEZ;BOZANO, LUISA, DOMINICA;SANDERS, DANIEL, PAUL;WATANABE, SATOSHI;MASUNAGA, KEIICHI;DOMON, DAISUKE;KAWAI, YOSHIO
分类号 G03F7/004;G03F7/038 主分类号 G03F7/004
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