| 发明名称 |
Plasma Processing Devices Having a Surface Protection Layer |
| 摘要 |
Plasma processing devices may include a process chamber body, a substrate support unit in a lower portion of the process chamber body, and a window part in an upper portion of the process chamber body. The window part may include a base layer and a surface protection layer on the base layer and configured to face the substrate support unit. The surface protection layer may include an oxide having a columnar structure. |
| 申请公布号 |
US2016079040(A1) |
申请公布日期 |
2016.03.17 |
| 申请号 |
US201514794383 |
申请日期 |
2015.07.08 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Park MyoungSoo;Kim Hakyoung;Sung Yumi;Lim Seungkyu |
| 分类号 |
H01J37/32;H01L21/67 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A plasma processing device, comprising:
a process chamber body; a substrate support unit in a lower portion of the process chamber body; and a window part in an upper portion of the process chamber body,wherein the window part comprises a base layer and a surface protection layer on the base layer and configured to face the substrate support unit, and
wherein the surface protection layer comprises an oxide having a columnar structure. |
| 地址 |
Suwon-si KR |
