发明名称 |
STT-MRAM CELL STRUCTURE INCORPORATING PIEZOELECTRIC STRESS MATERIAL |
摘要 |
A magnetic memory cell including a piezoelectric material, and methods of operating the memory cell are provided. The memory cell includes a stack, and the piezoelectric material may be formed as a layer in the stack or adjacent the layers of the cell stack. The piezoelectric material may be used to induce a transient stress during programming of the memory cell to reduce the critical switching current of the memory cell. |
申请公布号 |
US2016078912(A1) |
申请公布日期 |
2016.03.17 |
申请号 |
US201514947978 |
申请日期 |
2015.11.20 |
申请人 |
Micron Technology, Inc. |
发明人 |
Liu Jun;Kramer Steve;Sandhu Gurtej |
分类号 |
G11C11/16 |
主分类号 |
G11C11/16 |
代理机构 |
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代理人 |
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主权项 |
1. A method for reducing a critical switching current density of a memory cell during operation comprising:
generating a transient stress in a free ferromagnetic layer of the memory cell by generating a parasitic electric field to activate a piezoelectric material of the memory cell. |
地址 |
Boise ID US |