发明名称 STT-MRAM CELL STRUCTURE INCORPORATING PIEZOELECTRIC STRESS MATERIAL
摘要 A magnetic memory cell including a piezoelectric material, and methods of operating the memory cell are provided. The memory cell includes a stack, and the piezoelectric material may be formed as a layer in the stack or adjacent the layers of the cell stack. The piezoelectric material may be used to induce a transient stress during programming of the memory cell to reduce the critical switching current of the memory cell.
申请公布号 US2016078912(A1) 申请公布日期 2016.03.17
申请号 US201514947978 申请日期 2015.11.20
申请人 Micron Technology, Inc. 发明人 Liu Jun;Kramer Steve;Sandhu Gurtej
分类号 G11C11/16 主分类号 G11C11/16
代理机构 代理人
主权项 1. A method for reducing a critical switching current density of a memory cell during operation comprising: generating a transient stress in a free ferromagnetic layer of the memory cell by generating a parasitic electric field to activate a piezoelectric material of the memory cell.
地址 Boise ID US