发明名称 TEMPORARY ADHESIVE FOR PRODUCTION OF SEMICONDUCTOR DEVICE, AND ADHESIVE SUPPORT AND PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME
摘要 By a temporary adhesive for production of semiconductor device containing (A) a radical polymerizable monomer or oligomer containing a fluorine atom or a silicon atom, (B) a polymer compound, and (C) a radical polymerization initiator, a temporary adhesive for production of semiconductor device, which is excellent in coating property, which reduces a problem of generation of gas therefrom in the temporary support even under high temperature condition when the member to be processed (for example, a semiconductor wafer) is subjected to a mechanical or chemical processing, and further which can easily release the temporary support for the member processed without imparting damage to the member processed even after being subjected to a process at a high temperature, and an adhesive support and a production method of semiconductor device using the same are provided.
申请公布号 US2016075922(A1) 申请公布日期 2016.03.17
申请号 US201514953697 申请日期 2015.11.30
申请人 FUJIFILM Corporation 发明人 IWAI Yu;FUJIMAKI Kazuhiro;KOYAMA Ichiro;NAKAMURA Atsushi
分类号 C09J151/00;H01L21/683 主分类号 C09J151/00
代理机构 代理人
主权项 1. A temporary adhesive for production of semiconductor device comprising (A) a radical polymerizable monomer or oligomer containing a fluorine atom or a silicon atom, (B) a polymer compound, and (C) a radical polymerization initiator.
地址 Tokyo JP