发明名称 |
TEMPORARY ADHESIVE FOR PRODUCTION OF SEMICONDUCTOR DEVICE, AND ADHESIVE SUPPORT AND PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME |
摘要 |
By a temporary adhesive for production of semiconductor device containing (A) a radical polymerizable monomer or oligomer containing a fluorine atom or a silicon atom, (B) a polymer compound, and (C) a radical polymerization initiator, a temporary adhesive for production of semiconductor device, which is excellent in coating property, which reduces a problem of generation of gas therefrom in the temporary support even under high temperature condition when the member to be processed (for example, a semiconductor wafer) is subjected to a mechanical or chemical processing, and further which can easily release the temporary support for the member processed without imparting damage to the member processed even after being subjected to a process at a high temperature, and an adhesive support and a production method of semiconductor device using the same are provided. |
申请公布号 |
US2016075922(A1) |
申请公布日期 |
2016.03.17 |
申请号 |
US201514953697 |
申请日期 |
2015.11.30 |
申请人 |
FUJIFILM Corporation |
发明人 |
IWAI Yu;FUJIMAKI Kazuhiro;KOYAMA Ichiro;NAKAMURA Atsushi |
分类号 |
C09J151/00;H01L21/683 |
主分类号 |
C09J151/00 |
代理机构 |
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代理人 |
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主权项 |
1. A temporary adhesive for production of semiconductor device comprising (A) a radical polymerizable monomer or oligomer containing a fluorine atom or a silicon atom, (B) a polymer compound, and (C) a radical polymerization initiator. |
地址 |
Tokyo JP |