| 发明名称 |
POLISHING COMPOSITION |
| 摘要 |
A polishing composition for polishing a work including an oxide film and a nitride film, the composition having a pH of 2.0 or higher and containing silica that shows a positive zeta potential. |
| 申请公布号 |
WO2016039265(A1) |
申请公布日期 |
2016.03.17 |
| 申请号 |
WO2015JP75202 |
申请日期 |
2015.09.04 |
| 申请人 |
NITTA HAAS INCORPORATED |
发明人 |
YOSHIDA, KYOHEI;OTA, YOSHIHARU;HOSOKAWA, KOICHIRO |
| 分类号 |
C09K3/14;B24B37/00;C01G1/02;H01L21/304 |
主分类号 |
C09K3/14 |
| 代理机构 |
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