DITHERED DISPLAYS AND DITHERING PROCESSES AND APPARATUS

摘要

In one innovative aspect of the disclosure, a method includes patterning a first region and a first portion of a second region of a substrate using a first reticle. The method also includes patterning the second region and a first portion of the first region using a second reticle. The method additionally includes forming a first array of first patterned elements based on the patterning by the first reticle, and forming a second array of second patterned elements based on the patterning by the second reticle. In some implementations, each of the first and the second arrays are incomplete in each of the first portions. However, the first patterned elements in the first portion of the second region are complementary to the second patterned elements in the first portion of the second region. Similarly, the first patterned elements in the first portion of the first region are complementary to the second patterned elements in the first portion of the first region. In some such implementations, the combination of the first array and the second array form a complete array of patterned elements.

主权项

1. A device comprising:
a substrate including a first region and a second region, a boundary of the first region proximate a boundary of the second region; a first layer over the substrate, the first layer being patterned in the first region and in a first portion of the second region with a first array of first patterned elements; the first layer being further patterned in the second region and in a first portion of the first region with a second array of second patterned elements; each of the first and the second arrays being incomplete in each of the first portions; the first array of first patterned elements in the first portion of the second region being complementary to the second array of second patterned elements in the first portion of the second region; the first array of first patterned elements in the first portion of the first region being complementary to the second array of second patterned elements in the first portion of the first region; the combination of the first array of first patterned elements and the second array of second patterned elements in the first portions of the first and the second regions forming a complete array of patterned elements.