发明名称 半導体装置の作製方法
摘要 It is an object to provide a highly reliable thin film transistor with stable electric characteristics, which includes an oxide semiconductor film. The channel length of the thin film transistor including the oxide semiconductor film is in the range of 1.5 μm to 100 μm inclusive, preferably 3 μm to 10 μm inclusive; when the amount of change in threshold voltage is less than or equal to 3 V, preferably less than or equal to 1.5 V in an operation temperature range of room temperature to 180° C. inclusive or −25° C. to −150° C. inclusive, a semiconductor device with stable electric characteristics can be manufactured. In particular, in a display device which is an embodiment of the semiconductor device, display unevenness due to variation in threshold voltage can be reduced.
申请公布号 JP5886505(B2) 申请公布日期 2016.03.16
申请号 JP20140016383 申请日期 2014.01.31
申请人 株式会社半導体エネルギー研究所 发明人 山崎 舜平;津吹 将志;郷戸 宏充
分类号 H01L29/786;G09F9/30;H01L21/336;H01L51/50;H05B33/14 主分类号 H01L29/786
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