发明名称 Uniformity Control using Adjustable Internal Antennas
摘要 A plasma chamber having improved plasma density is disclosed. The plasma chamber utilizes internal antennas. These internal antennas can be manipulated in a variety of ways to control the uniformity of the plasma density. In some embodiments, the conductive coil within the antenna is translated from a first location to a second location. For example, the entirety of the internal antennas may be translated within the plasma chamber. In another embodiment, the conductive coil disposed within the outer tube is translated relative to its outer tube. In another embodiment, the conductive coil within the outer tube may be bent and may be rotated within the outer tube. In another embodiment, the outer tube may also be bent and rotated. In other embodiments, ferromagnetic segments may be disposed in the outer tube to focus or block the electromagnetic energy emitted from the conductive coil.
申请公布号 US2016079042(A1) 申请公布日期 2016.03.17
申请号 US201414484018 申请日期 2014.09.11
申请人 Varian Semiconductor Equipment Associates, Inc. 发明人 Likhanskii Alexandre;Radovanov Svetlana B.
分类号 H01J37/32;H01J37/02 主分类号 H01J37/32
代理机构 代理人
主权项 1. A plasma chamber, comprising: an internal antenna, comprising a plurality of sections, each section comprising: an outer tube; anda conductive coil disposed within the outer tube; an RF power source coupled to the conductive coils; and an actuator to move the conductive coils from a first position to a second position within the plasma chamber.
地址 Gloucester MA US