| 摘要 |
The method involves positively and electrically polarizing an average Faraday shield with respect to insulating or metallic substrates e.g. metallic girder (3), or with respect to a counter electrode present in a plasma. The plasma is maintained in a treatment zone (2) by an inductive radio frequency coupling using an inductor that is connected to a radio frequency generator. The inductor is protected from any contamination by a matter emitted by a surface of the substrates via the Faraday shield that is positioned between the plasma and the inductor. An independent claim is also included for a device for plasma-treatment of an insulating or metallic substrate. |
