酸化亜鉛焼結体、それから成るスパッタリングターゲットおよび酸化亜鉛薄膜

摘要

There is provided a zinc oxide sintered compact with a zirconium content of 10 to 1000 ppm, and a sputtering target containing the zinc oxide sintered compact. There is also provided a zinc oxide thin-film having a zirconium content of 10 to 2000 ppm and a resistivity of 10 ©·cm or greater.