发明名称 |
PROCESS FOR MANUFACTURE OF SEMICONDUCTOR DEVICES |
摘要 |
A process for the manufacture of semiconductor devices is provided. The process comprises the chemical-mechanical polishing of a substrate or layer containing at least one III-V material in the presence of a chemical-mechanical polishing composition (Q1) comprising (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a polymer comprising at least one N-heterocycle, and (M) an aqueous medium and whereas Q1 has a pH of from 1.5 to 4.5. |
申请公布号 |
EP2847785(A4) |
申请公布日期 |
2016.03.16 |
申请号 |
EP20130788644 |
申请日期 |
2013.04.29 |
申请人 |
BASF SE |
发明人 |
FRANZ, DIANA;NOLLER, BASTIAN MARTEN |
分类号 |
H01L21/306;C09G1/02;C09K3/14 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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