| 摘要 |
A liquid jetting apparatus includes: a liquid jetting head configured to have a liquid jetting surface on which a plurality of nozzles, from which liquid is jetted, are open; a wiper configured to move, relative to and along the liquid jetting surface, while being brought in contact with the liquid jetting surface and to wipe the liquid adhered on the liquid jetting surface; a wiper movement mechanism configured to move the wiper in a direction orthogonal to the liquid jetting surface and to make the wiper approach to or separate from the liquid jetting surface. The wiper moving mechanism includes: a cam configured to have a cam surface; an axis configured to extend along the liquid jetting surface; and an arm member configured to make the wiper approach to the liquid jetting surface by pushing and moving the wiper in accordance with movement of the cam. |
