| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of suppressing reverse flow of an atmosphere outside a processing chamber 204 into the processing chamber 204 in a case that an atmospheric pressure sensor 41 malfunctions. <P>SOLUTION: A substrate processing apparatus comprises: a processing chamber processing a substrate; a pressure sensor detecting the pressure in the processing chamber; an atmospheric pressure sensor outputting an atmospheric pressure detection signal when the pressure in the processing chamber becomes the same as the atmospheric pressure outside the processing chamber; an atmosphere exhaust pipe communicating the inside of the processing chamber with the atmosphere outside the processing chamber; an exhaust valve provided in the atmosphere exhaust pipe; and a control part communicating the inside of the processing chamber with the outside of the processing chamber by opening the exhaust valve when the atmospheric pressure sensor outputs the atmospheric pressure detection signal and a detection value of the pressure sensor is equal to or greater than the predetermined value. <P>COPYRIGHT: (C)2013,JPO&INPIT |
