发明名称 Light-emitting diode and method for manufacturing the same
摘要 The disclosure provides a light-emitting diode and a method for manufacturing the same. The light-emitting diode comprises a N-type metal electrode, a N-type semiconductor layer contacted with the N-type metal electrode, a P-type semiconductor layer, a light-emitting layer interposed between the N-type semiconductor layer and the P-type semiconductor layer, a low-contact-resistance material layer positioned on the P-type semiconductor layer, a transparent conductive layer covered the low-contact-resistance material layer and the P-type semiconductor layer, and a P-type metal electrode positioned on the transparent conductive layer.
申请公布号 US9287461(B2) 申请公布日期 2016.03.15
申请号 US201314054303 申请日期 2013.10.15
申请人 LEXTAR ELECTRONICS CORPORATION 发明人 Hsiao Chia-Lin;Hsu Nai-Wei;Wang Te-Chung;Yang Tsung-Yu
分类号 H01L33/38;H01L33/42;H01L33/14 主分类号 H01L33/38
代理机构 Moser Taboada 代理人 Moser Taboada
主权项 1. A light-emitting diode comprising: an N-type metal electrode; an N-type semiconductor layer contacting the N-type metal electrode; a P-type semiconductor layer; a light-emitting layer sandwiched between the N-type semiconductor layer and the P-type semiconductor layer; a low-contact-resistance material layer positioned on a part of the P-type semiconductor layer; a transparent conductive layer covering the low-contact-resistance material layer and the P-type semiconductor layer; a P-type metal electrode positioned on the transparent conductive layer; and a metal-indium contact layer positioned between the P-type semiconductor layer and the transparent conductive layer, wherein the low-contact-resistance material layer is embedded in the metal-indium contact layer and protrudes above a surface of the metal-indium contact layer into the transparent conductive layer.
地址 Hsinchu TW