Scanner based optical proximity correction system and method of use

摘要

A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether δ1<ε1, wherein δ1 represents model vs. exposure difference and ε1 represents predetermined criteria. The technique further includes completing the model when δ1<ε1.

主权项

1. A modeling method, comprising:
inputting tool parameters into a model; inputting basic model parameters into the model; generating a simulated, corrected reticle design using the tool parameters and the basic model parameters; comparing an image of test patterns for an integrated circuit against the simulated, corrected reticle design; determining whether a difference between the simulated, corrected reticle design and exposure results of the image of the test patterns is less than a predetermined criteria; completing the model when the difference between the simulated, corrected reticle design and the exposure results of the image of the test patterns is less than the predetermined criteria; and outputting information about variation of image to the tool parameters in order to determine which tool parameters are to be used in the model.