| 发明名称 |
Dosing system for a dishwasher machine |
| 摘要 |
The invention relates to a dispensing system (1) for delivering at least one cleaning-agent preparation (A, B, C) into the interior of an automatic dishwasher, encompassing a dispenser (2) having a light source (4), and a cartridge (3) couplable to the dispenser (2), in which cartridge at least one flowable preparation (A, B, C) is stocked; the cartridge (3) has a width (b) to depth (t) ratio from 3:1 to 20:1 and the cartridge (3) has a height (h) to depth (t) ratio from 3:1 to 20:1, and the walls of the cartridge (3) have, at least locally, a transmittance from 75% to 99% in the wavelength region between 700 nm and 1 mm; the flowable preparation (A, B, C) has a transmittance from 75% to 99% in the wavelength region between 700 nm and 1 mm. |
| 申请公布号 |
US9282876(B2) |
申请公布日期 |
2016.03.15 |
| 申请号 |
US201314031204 |
申请日期 |
2013.09.19 |
| 申请人 |
Henkel AG & Co. KGaA |
发明人 |
Benda Konstantin;Bastigkeit Thorsten;Kessler Arnd;Fileccia Salvatore;Nitsch Christian |
| 分类号 |
A47L15/44;A47L15/00 |
主分类号 |
A47L15/44 |
| 代理机构 |
|
代理人 |
Krivulka Thomas G. |
| 主权项 |
1. A dispensing system (1) for delivering at least one cleaning-agent preparation (A, B, C) into the interior of an automatic dishwasher, encompassing a dispenser (2) having a light source (4), and a cartridge (3) couplable to the dispenser (2), in which cartridge at least one flowable preparation (A, B, C) is stocked, wherein
a. the cartridge (3) has a width (b) to depth (t) ratio from 3:1 to 20:1; b. the cartridge (3) has a height (h) to depth (t) ratio from 3:1 to 20:1; c. the walls of the cartridge (3) have a transmittance from 75% to 99% in the wavelength region between 700 nm and 1 mm; d. the flowable preparation (A, B, C) has a transmittance from 75% to 99% in the wavelength region between 700 nm and 1 mm; e. the outwardly directed surface of the cartridge (3) has a surface roughness between 0.5 and 5 microns; f. the light source (4), which emits light at least in a wavelength region between 700 nm and 1 mm into the cartridge; g. the light source (4) has an emission angle α greater than 5°, and h. the light source (4) and the cartridge (3) are configured in such a way that an average path length of the light beam (L) through the cartridge (3) corresponds to between 0.1*105 and 10*105 times the wavelength of the light emitted from the light source (4). |
| 地址 |
Duesseldorf DE |
