发明名称 反射型マスクおよびその製造方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a reflective mask which has a light shielding region with high light shielding performance, and a method for manufacturing the same. <P>SOLUTION: The reflective mask comprises a multilayer reflection layer formed on a surface of a substrate, and an absorption layer formed on the multilayer reflection layer and having a circuit pattern. A light shielding region in which the absorption layer and the multilayer reflection layer are removed is formed outside a region of the circuit pattern. An opening width of the bottom of the light shielding region formed in the multilayer reflection layer is wider than an opening width of the light shielding region formed in the absorption layer. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP5884565(B2) 申请公布日期 2016.03.15
申请号 JP20120052091 申请日期 2012.03.08
申请人 凸版印刷株式会社 发明人 福上 典仁;坂田 陽
分类号 G03F1/22;G03F7/20 主分类号 G03F1/22
代理机构 代理人
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