发明名称 |
Three terminal fuse with FinFET |
摘要 |
A technique is provided for programming a transistor having a source, a drain, a gate, and a channel region between the source and the drain. The gate is above dielectric above the channel region. A gate voltage is about equal to or greater than a breakdown voltage of the gate dielectric in order to break down the gate dielectric into a breakdown state. Current flows between the source and the drain as a result of breaking down the gate dielectric. In response to the transistor being programmed, the current flowing between the source and the drain is not based on the gate voltage at the gate. |
申请公布号 |
US9287000(B1) |
申请公布日期 |
2016.03.15 |
申请号 |
US201514748473 |
申请日期 |
2015.06.24 |
申请人 |
International Business Machines Corporation |
发明人 |
Liu Derrick;Yeh Chun-Chen |
分类号 |
G11C17/00;G11C17/18;G11C17/16;G11C11/40 |
主分类号 |
G11C17/00 |
代理机构 |
Cantor Colburn LLP |
代理人 |
Cantor Colburn LLP ;Alexanian Vazken |
主权项 |
1. A method for programming a transistor having a source, a drain, a gate, a channel region between the source and the drain, and a gate dielectric above the channel region, the method comprising:
applying a gate voltage about equal to or greater than a breakdown voltage of the gate dielectric in order to break down the gate dielectric into a breakdown state; and causing current to flow between the source and the drain as a result of breaking down the gate dielectric; wherein, in response to the transistor being programmed, the current flowing between the source and the drain is not based on the gate voltage at the gate. |
地址 |
Armonk NY US |